OXFORD INSTRUMENTS OMNIPROBE

Omniprobe specialise in industry leading tools for nanomanipulation and nanofabrication in the FIBSEM and SEM. These include the Autoprobe range of nanomanipulators plus the OmniGIS revolutionary multi gas delivery system for FIB or SEM.

NANOMANIPULATORS

The Autoprobe range of nanomanipulators is available to meet every budget and application from low cost open loop systems to closed loop systems able to move diagonally in any direction with nanometre resolution.

Typical applications for the Omniprobe Autoprobe include:

TEM sample preparation with FIB lift-out solutions for plan-view and backside milling
Making correlative TEM and atom probe nanowire samples
Creating high quality samples for improved TEM, EDS and / or EBSD and other types of analysis where either sample thickness or shadowing may otherwise be a problem
Neutralising highly charging areas on uncoated insulating specimens
Measurement of electrical parameters of nanostructures

Benefits Include (depending on model):

Port-Mounted, Freeing up Stage & Chamber Space
Move Linearly in ANY direction with nanometre precision
Ability to change Tips without Venting
Quickly Reorient Samples In Situ
Perform Electrical & Nano-mechanical Testing
Easily Perform Nanomanipulation Tasks using the stage frame of reference
Perform quick and easy ex-situ grid attach using OmniCut^® – also allows easy generation of inverted atom probe / TEM tomography samples
Digital, closed loop, 360 degree probe tip rotation keeping the tip in view for tip shaping or sample repositioning (see images below)

GAS INJECTION SYSTEMS

OmniGIS II Gas Injection System

The OmniGIS II is a revolutionary single port, single nozzle, multiple gas injection system (GIS), enabling users to construct nanostructures in the SEM or FIB with unprecedented precision, speed and usability

Typical applications for the Omniprobe OmniGIS include:

— FAILURE ANALYSIS AND MATERIALS CHARACTERISATION

Deposit conductive metals for electrical measurements or SPM techniques such as SSRM
Create nanomarks for sample localisation and TEM lamella end-pointing
Create strong, reliable Pt welds for nanomanipulation
Minimise curtaining artefacts in FIB samples by depositing W or C milling masks
Reduce FIB re-deposition by flowing XeF2 while milling
Improve imaging and elemental analysis with high contrast, low background protection layers

— GENERATION OF NANOSTRUCTURES

Make nano-pillars, move nanowires and modify carbon nanotubes
Customise AFM cantilevers
Create electron emission tips
Faster nano-patterns achieved using unique gas flux processes with a wide range of carrier gases
Create high resolution nanostructures with controlled gas flow to desired target pressures

— DEVELOP NEW PROCESSES

Extend the FIB or SEM to advanced techniques such as atomic layer deposition (ALD) and self-assembled monolayers (SAMS).

Deliver precursors sequentially in a pre-programmed repetitive sequence to produce ”GIS-ALD” films
Enable nanoscale imaging, patterning and deposition on commercial SEM or FIB

— NANOLITHOGRAPHY (REQUIRES SCAN GENERATOR)

Perform direct write lithography using an electron or ion beam to accurately pattern nanostructures without the need for a mask.

Rapid prototyping of bottom-up nano-circuits with single step processes
No ’proximity effect’ correction required
Excellent alternative for resist-limited high aspect ratio patterning
Enable lithography on previously impossible samples
Immediately characterise results with appropriate accessories
Enhanced pressure control for optimised lithography
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Enabling results for science and industry